F. Roozeboom

S. De Gendt

A. Delabie

J. W. Elam

O. van der Straten

A. Londergan

Atomic Layer Deposition Applications 10

The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.

Atomic Layer Deposition Applications 6

C. Huffman

Atomic Layer Deposition Applications 11

J. W. Elam

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